DLC-Coating System with HiPIMS V+ and DC-pulsed Magnetron Sputtering Technology

The xPro4C is the most advanced industrial small size DLC (diamond-like-carbon) coating system, which includes the positive pulse HiPIMS V+ *-technology. It is specifically designed for the deposition of high performance DLC coatings, such as a-C, a-C:H, ta-C and a-C:Me and many others. Such coatings are sputtered in HiPIMS V+ and DC-pulsed magnetron sputtering mode onto a variety of cutting tools, dies and moulds, components and consumer products for highly advantageous tribological purposes, i.e. extremely low cof (coefficient of friction) and high wear resistance. Besides the DLC coatings, in the xPro4C system also high performance metallurgical coatings, such as AlCrSiN, AlTiSiN, AlCrN, AlTiN, CrN, TiC,N, TiN and many others can be deposited with extremely smooth surface structures.

pvt anlage xpro 4C

The xPro4C is characterized by:

  • Robust system designed for the rigorous production environment using sophisticated vacuum coating technologies.
  • Rugged construction marked by an extremely advanced highly refined design.
  • Extreme reliability based on intelligent straightforward design and construction.
  • The broadest spectrum of coatings and coating technology available in a single system at the lowest possible cost.
  • Fully automatic, computer controlled, closed loop process control providing process repeatability, reliability and a user-friendly environment.
  • The coating industry‘s broadest capabilities in the smallest footprint

Technical Highlights of the xPro4C:

HiPIMS V+-technology**
  • HiPIMS V+ positive pulsing technology
  • Increased deposition rate compared to standard HiPIMS
  • Tailoring of ion energy distribution
  • Reducing magnetron arcing
DC-pulsed V+-technology for carbon
  • High hardness of DLC – films up to 35 GPa
  • Excellent control of sp³/sp² bonding ratio
Short process time
  • Efficient heating capabilities
  • Efficient cleaning and etching cycle
Most reliable components
  • Brand name components
  • Clever integration
    Improved software design
    • Extreme ease of use
    • Highly reproducible runs
    • High level of flexibility for custom tailored coating solutions
    • Remote control and diagnostics
    Improved thermal management
    • Intensive water cooling
    • Double walled construction
    Most reliable components
    • Brand name components
    • Clever integration
    Improved part handling and fixturing
    • Safest most manoeuvrable transport carts
    • Easy to load and use carts with high load capabilities

    System data

    Size of vacuum chamber 680 x 650 x 1150 mm (L x W x H)
    Coating volume 350 × 700 mm (Ø × H)

    No. of rotary platform
    (substrate carrier)

    1 pc

    Size of substrate carrier

    480 x 430 x 1015 mm (L x W x H)

    Pumping 2 pcs double stage rotary vane pump
    1 pc Roots pump
    2 pcs turbo-molecular pump

    4 pcs large area magnetron sputtering sources

    Power supplies 1 pc HiPIMS power supply @ 10 kW
    1 pc 10 kW HiPIMS bias power supply
    3 pcs dc-pulsed power supplies @ 10 kW each
    Heater 2 pcs, rated @ 5 kW each
    Overall size 4.000 x 1.300 x 2.250 mm (L x W x H)
    Power 75 kW, 400 V, 3 ph + N, 50/60 Hz

    System capacity

    Plasma volume 350 × 740 mm (Ø × H)
    End mills Ø 4 × 50 mm 1.340 St.
    End mills Ø 12 × 75 mm 480 St.
    Inserts ½″ x ½″ x 4 mm 2.800 St.
    Hobs Ø 80 × 80 mm 72 St.
    Hobs Ø 100 × 100 mm 42 St.

    * HiPIMS V+ = High Power Impulse Magnetron Sputtering
    ** V+ = HiPIMS with Positive Reverse Pulsing